Composition for organic light emitting diode encapsulation and organic light emitting diode display manufactured therefrom

ABSTRACT

Provided are: a composition for an organic light emitting diode comprising an indole-based photocurable monomer, a non-indole-based photocurable monomer, and an initiator, and an organic light emitting display manufactured therefrom.

CROSS-REFERENCE TO RELATED APPLICATION

This application is a continuation of U.S. patent application Ser. No.16/632,818, filed on Jan. 21, 2020, which is a U.S. National PhasePatent Application of International Application No. PCT/KR2018/007657,filed on Jul. 5, 2018, which claims priority to and the benefit ofKorean Patent Application No. 10-2017-0093003, filed on Jul. 21, 2017,the entire contents of all of which are incorporated herein byreference.

TECHNICAL FIELD

The present invention relates to a composition for encapsulating anorganic light emitting diode and an organic light emitting diode displaymanufactured using the same.

BACKGROUND ART

An organic light emitting diode display is a luminous display andincludes an organic light emitting diode(s). Since the organic lightemitting diode can suffer from deterioration in luminous properties uponcontact with external moisture or oxygen, the organic light emittingdiode must be encapsulated with an encapsulation composition. Theorganic light emitting diode is encapsulated in a multilayer structureincluding an inorganic barrier layer and an organic barrier layer. Theinorganic barrier layer is formed by plasma deposition, in which theorganic barrier layer can be etched by plasma. If the organic barrierlayer is etched, an encapsulation function of the organic barrier layercan be damaged, thereby causing deterioration in luminous properties andreliability of the light emitting diode.

On the other hand, the organic light emitting diode display isinevitably exposed to external light including UV light in use. Theorganic light emitting diode display can suffer from discoloration andreduction in lifespan due to damage to an organic light emittingmaterial when exposed to UV light for a long period of time.Accordingly, a composition for encapsulating an organic light emittingdiode can be used to prevent the damage to the organic light emittingdiode by blocking UV light.

Korean Patent Laid-open Publication No 2011-0071039 discloses a methodfor sealing an organic light emitting diode.

DISCLOSURE Technical Problem

On object of the present invention is to provide a composition forencapsulating an organic light emitting diode, which can suppress damageto the organic light emitting diode and extend lifespan of the organiclight emitting diode by efficiently blocking UV light having awavelength of 420 nm or less.

Another object of the present invention is to provide a composition forencapsulating an organic light emitting diode, which can realize anorganic barrier layer having high resistance to plasma so as to improvereliability of the organic light emitting diode.

A further object of the present invention is to provide a compositionfor encapsulating an organic light emitting diode, which can realize anorganic barrier layer having a high photocuring rate.

Technical Solution

In accordance with one aspect of the present invention, a compositionfor encapsulating an organic light emitting diode includes an indolebased photocurable monomer, a non-indole based photocurable monomer, andan initiator.

In accordance with another aspect of the present invention, an organiclight emitting diode display includes an organic light emitting diodeand a barrier stack formed on the organic light emitting diode andincluding an inorganic barrier layer and an organic barrier layer,wherein the organic barrier layer is formed of the composition forencapsulating an organic light emitting diode according to the presentinvention.

Advantageous Effects

The present invention provides a composition for encapsulating anorganic light emitting diode, which can suppress damage to the organiclight emitting diode and extend lifespan of the organic light emittingdiode by efficiently blocking UV light having a wavelength of 420 nm orless.

The present invention provides a composition for encapsulating anorganic light emitting diode, which can realize an organic barrier layerhaving high resistance to plasma to improve reliability of an organiclight emitting diode.

The present invention provides a composition for encapsulating anorganic light emitting diode, which can realize an organic barrier layerhaving a high photocuring rate.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross-sectional view of an organic light emitting diodedisplay according to one embodiment of the present invention.

FIG. 2 is a cross-sectional view of an organic light emitting diodedisplay according to another embodiment of the present invention.

BEST MODE

Embodiments of the present invention will be described in detail withreference to the accompanying drawings. It should be understood that thepresent invention may be embodied in different ways and should notlimited to the following embodiments. In the drawings, portionsirrelevant to the description will be omitted for clarity. Likecomponents will be denoted by like reference numerals throughout thespecification.

Herein, the term “(meth)acryl” may refer to “acryl” and/or “methacryl”.

Herein, unless otherwise stated, the term “substituted” means that atleast one hydrogen atom of a functional group is substituted with ahalogen (F, Cl, Br or I), a hydroxyl group, a nitro group, a cyanogroup, an imino group (═NH, ═NR, R being a C₁ to C₁₀ alkyl group), anamino group (—NH₂, —NH(R′), —N(R″)(R′″), R′, R″ and R′″ beingindependently a C₁ to C₁₀ alkyl group), an amidino group, a hydrazine orhydrazone group, a carboxyl group, a C₁ to C₂₀ alkyl group, a C₆ to C₃₀aryl group, a C₃ to C₃₀ cycloalkyl group, a C₃ to C₃₀ heteroaryl group,or a C₂ to C₃₀ heterocycloalkyl group.

Herein, the term “aryl group” refers to a functional group in which allelements of a cyclic substituent have p-orbitals, and these p-orbitalsare conjugated. The aryl group includes monocyclic, non-fused polycyclicor fused polycyclic functional groups. Here, the term “fused” means thata pair of carbon atoms is shared by contiguous rings. The aryl groupalso includes biphenyl groups, terphenyl groups, or quaterphenyl groups,in which at least two aryl groups are connected to each other through asigma bond. The aryl group may refer to a phenyl group, a naphthylgroup, an anthracenyl group, a phenanthrenyl group, a pyrenyl group, achrysenyl group, and the like.

Herein, the term “alkyleneoxy group” refers to a functional group inwhich at least one alkylene group is linked to at least one oxygen atom.For example, the alkyleneoxy group may include an (alkylene group-oxygenatom)_(n)-alkylene group, an (alkylene group-oxygenatom-alkylene)_(n)-alkylene group, an alkylene group-oxygen atom, or an-(oxygen atom-alkylene group)_(n)-, n may be an integer of 1 to 10.

A (encapsulation) composition for encapsulating an organic lightemitting diode according to one embodiment of the present invention mayinclude an indole based photocurable monomer, a non-indole basedphotocurable monomer, and an initiator. With the indole basedphotocurable monomer, the encapsulation composition can reduce lighttransmittance with respect to UV light having a wavelength of 420 nm orless, preferably 410 nm or less, thereby minimizing damage to theorganic light emitting diode so as to improve lifespan of the organiclight emitting diode. With the indole based photocurable monomer, theencapsulation composition can realize an organic barrier layer havinghigh resistance to plasma to improve lifespan and reliability of theorganic light emitting diode. The indole based photocurable monomercontains a photocurable functional group so as to be cured together withthe non-indole based photocurable monomer, thereby improving thephotocuring rate of the encapsulation composition. A composition forencapsulating an organic light emitting diode, which includes an indolebased UV absorbent free from an indole based photocurable monomer and aphotocurable functional group, can suffer from outgassing anddeterioration in panel reliability due to the presence of unreactedmolecules.

According to the present invention, the indole based photocurablemonomer, the non-indole based photocurable monomer, and the initiatorsare different compounds. Now, the indole based photocurable monomer, thenon-indole based photocurable monomer, and the initiator will now bedescribed in more detail.

Indole Based Photocurable Monomer

The indole based photocurable monomer has an indole functional group anda photocurable functional group. Preferably, a cyano (C≡N) group-coupledvinyl group is coupled to the indole functional group.

The indole based photocurable monomer absorbs light having a wavelengthof 420 nm or less, preferably 410 nm or less, more preferably 405 nm orless, thereby reducing light transmittance at the correspondingwavelength to suppress damage to an organic light emitting diode,particularly a blue light emitting diode. A cured product obtained bycuring the encapsulation composition according to the present inventionhas a light transmittance of 20% or less, preferably 15% or less, morepreferably 10% or less, at a wavelength of 420 nm or less, preferably410 nm, more preferably 405 nm. Within this range of lighttransmittance, the encapsulation composition can sufficiently suppressdamage to the organic light emitting diode. A number of absorbentscapable of absorbing light in the above wavelength range are well-knownin the art. However, with the indole based photocurable monomeraccording to the present invention, the encapsulation composition canhave significantly low light transmittance in the above wavelength rangeand can exhibit plasma resistance described below. In addition, when aphotoinitiator is used as the initiator, the photoinitiator does notobstruct UV absorption upon curing of the encapsulation compositionthrough UV irradiation, thereby sufficiently improving the photocuringrate of the encapsulation composition. The encapsulation compositionaccording to the present invention may have a photocuring rate of 85% ormore, preferably 90% or more. Within this range of photocuring rate, theencapsulation composition can have low shrinkage stress after curing toform a layer in which a shift does not occur, and thus can be used forencapsulation of an organic light emitting diode.

The indole based photocurable monomer can form an organic barrier layerhaving good plasma resistance, thereby improving lifespan andreliability of the organic light emitting diode. A cured productobtained by curing the encapsulation composition according to thepresent invention has a plasma etching rate of 7% or less. Within thisrange, the encapsulation composition can prevent an organic barrierlayer from being removed by plasma etching upon formation of aninorganic barrier layer on the organic barrier layer, thereby improvingreliability of the organic light emitting diode.

In one embodiment, the indole based photocurable monomer may berepresented by Formula 1:

wherein in Formula 1, R¹ is a substituted or unsubstituted C₁ to C₁₀alkyl group, a substituted or unsubstituted C₆ to C₂₀ aryl group, or asubstituted or unsubstituted C₇ to C₂₀ arylalkyl group,

R² is a substituted or unsubstituted C₆ to C₂₀ aryl group,

R³ is a substituted or unsubstituted C₁ to C₁₀ alkylene group, or asubstituted or unsubstituted C₁ to C₁₀ alkyleneoxy group, and

R⁴ is a hydrogen atom or a substituted or unsubstituted C₁ to C₅ alkylgroup.

Specifically, in Formula 1, R¹ may be a substituted or unsubstituted C₁to C₁₀ alkyl group, preferably a substituted or unsubstituted C₁ to C₅alkyl group. Specifically, in Formula 1, R² may be a substituted orunsubstituted C₆ to C₁₈ aryl group, preferably a substituted orunsubstituted C₆ to C₁₂ aryl group. Specifically, in Formula 1, R³ maybe a substituted or unsubstituted C₁ to C₅ alkylene group or asubstituted or unsubstituted C₁ to C₁₀ alkyleneoxy group, for example,(alkylene group-oxygen atom)_(n)-alkylene group, where n is an integerof 1 to 10.

Specifically, the monomer of Formula 1 may be represented by any one of<Formula 1-1> to <Formula 1-4>:

The monomer of Formula 1 may be prepared using a commercially availablereaction material by a method described in Preparative Example 1.

The indole based photocurable monomer may be present in an amount of 1wt % to 10 wt %, preferably 1 wt % to 7 wt %, more preferably 2 wt % to5 wt %, based on the total amount of the indole based photocurablemonomer, the non-indole based photocurable monomer, and the initiator.Within this range, the indole based photocurable monomer can reducelight transmittance of the encapsulation composition in the abovewavelength range, thereby preventing damage to the organic lightemitting diode while improving plasma resistance.

Non-Indole Based Photocurable Monomer

The non-indole based photocurable monomer may include a photocurablemonomer excluding the indole based photocurable monomer. The non-indolebased photocurable monomer is free from an indole group and can mean amonomer having a photocurable functional group (for example, a(meth)acrylate group, a vinyl group, and the like).

The non-indole based photocurable monomer may be a monofunctionalmonomer, a polyfunctional monomer, or a mixture thereof. Herein,“monofunctional monomer” may mean a monomer having a single photocurablefunctional group. Herein, the “polyfunctional monomer” may mean amonomer having two or more photocurable functional groups, preferablytwo to six photocurable functional groups. Preferably, the non-indolebased photocurable monomer includes a mixture of the monofunctionalmonomer and the polyfunctional monomer.

The monofunctional monomer can improve the photocuring rate of theencapsulation composition. In addition, the monofunctional monomer canimprove light transmittance of an organic barrier layer while reducingviscosity of the encapsulation composition.

The monofunctional monomer may include at least one of (B1) an aromaticmono(meth)acrylate containing an aromatic group and (B2) a non-aromaticmono(meth)acrylate free from an aromatic group. Preferably, themonofunctional monomer is the aromatic mono(meth)acrylate (B1) alone.Preferably, the monofunctional monomer is a mixture of the aromaticmono(meth)acrylate (B1) and the non-aromatic mono(meth)acrylate (B2).

The aromatic mono(meth)acrylate (B1) may include an aromaticgroup-containing mono(meth)acrylate. The aromatic mono(meth)acrylate(B1) may include a substituted or unsubstituted aromaticgroup-containing mono(meth)acrylate. Here, the term “aromatic group”means a monocyclic aromatic group or a polycyclic aromatic groupincluding fused forms and the like, or means a form in which singlerings are connected to each other by a sigma bond. Herein, the aromaticgroup is a non-indole based group free from an indole group. Forexample, the aromatic group may include at least one of a substituted orunsubstituted C₆ to C₅₀ aryl group, a substituted or unsubstituted C₇ toC₅₀ arylalkyl group, a substituted or unsubstituted C₃ to C₅₀ heteroarylgroup, and a substituted or unsubstituted C₃ to C₅₀ heteroarylalkylgroup. More specifically, the aromatic group may include at least one ofphenyl, biphenyl, terphenyl, quaterphenyl, naphthyl, anthracenyl,phenanthrenyl, chrysenyl, triphenylenyl, tetracenyl, pyrenyl,benzopyrenyl, pentacenyl, coronenyl, ovalenyl, corannulenyl, benzyl,pyridinyl, pyrazinyl, pyrimidinyl, pyridazinyl, triazinyl, quinolinyl,isoquinolinyl, quinoxalinyl, acridinyl, quinazolinyl, cinnolinyl,phthalazinyl, thiazolyl, benzothiazolyl, isoxazolyl, benzisoxazolyl,oxazolyl, benzoxazolyl, pyrazolyl, indazolyl, imidazolyl,benzimidazolyl, purinyl, thiophenyl, benzothiophenyl, furanyl,benzofuranyl, and isobenzofuranyl groups.

For example, the aromatic mono(meth)acrylate (B1) may be represented byFormula 2:

wherein in Formula 2,

R₅ is a hydrogen atom or a methyl group, s is an integer of 0 to 10, andR₆ is a substituted or unsubstituted C₆ to C₅₀ aryl group or asubstituted or unsubstituted C₆ to C₅₀ aryloxy group.

For example, R₆ may be a phenylphenoxyethyl group, a phenoxyethyl group,a benzyl group, a phenyl group, a phenylphenoxy group, a phenoxy group,a phenylethyl group, a phenylpropyl group, a phenylbutyl group, amethylphenylethyl group, a propylphenylethyl group, a methoxyphenylethylgroup, a cyclohexylphenylethyl group, a chlorophenylethyl group, abromophenylethyl group, a methylphenyl group, a methylethylphenyl group,a methoxyphenyl group, a propylphenyl group, a cyclohexylphenyl group, achlorophenyl group, a bromophenyl group, a phenylphenyl group, abiphenyl group, a terphenyl group, a quaterphenyl group, an anthracenylgroup, a naphthalenyl group, a triphenylenyl group, a methylphenoxygroup, an ethylphenoxy group, a methylethylphenoxy group, amethoxyphenyloxy group, a propylphenoxy group, a cyclohexylphenoxygroup, a chlorophenoxy group, a bromophenoxy group, a biphenyloxy group,a terphenyloxy group, a quaterphenyloxy group, an anthracenyloxy group,a naphthalenyloxy group, or a triphenylenyloxy group.

Specifically, the aromatic mono(meth)acrylate (B1) may include at leastone of 2-phenylphenoxyethyl (meth)acrylate, phenoxyethyl (meth)acrylate,phenyl (meth)acrylate, phenoxy (meth)acrylate, 2-ethylphenoxy(meth)acrylate, benzyl (meth)acrylate, 2-phenylethyl (meth)acrylate,3-phenylpropyl (meth)acrylate, 4-phenylbutyl (meth)acrylate,2-(2-methylphenyl)ethyl (meth)acrylate, 2-(3-methylphenyl)ethyl(meth)acrylate, 2-(4-methylphenyl)ethyl (meth)acrylate,2-(4-propylphenyl)ethyl (meth)acrylate, 2-(4-(1-methylethyl)phenyl)ethyl(meth)acrylate, 2-(4-methoxyphenyl)ethyl (meth)acrylate,2-(4-cyclohexylphenyl)ethyl (meth)acrylate, 2-(2-chlorophenyl)ethyl(meth)acrylate, 2-(3-chlorophenyl)ethyl (meth)acrylate,2-(4-chlorophenyl)ethyl (meth)acrylate, 2-(4-bromophenyl)ethyl(meth)acrylate, 2-(3-phenylphenyl)ethyl (meth)acrylate,4-(biphenyl-2-yloxy)butyl (meth)acrylate, 3-(biphenyl-2-yloxy)butyl(meth)acrylate, 2-(biphenyl-2-yloxy)butyl (meth)acrylate,1-(biphenyl-2-yloxy)butyl (meth)acrylate, 4-(biphenyl-2-yloxy)propyl(meth)acrylate, 3-(biphenyl-2-yloxy)propyl (meth)acrylate,2-(biphenyl-2-yloxy)propyl (meth)acrylate, 1-(biphenyl-2-yloxy)propyl(meth)acrylate, 4-(biphenyl-2-yloxy)ethyl (meth)acrylate,3-(biphenyl-2-yloxy)ethyl (meth)acrylate, 2-(biphenyl-2-yloxy)ethyl(meth)acrylate, 1-(biphenyl-2-yloxy)ethyl (meth)acrylate,2-(4-benzylphenyl)ethyl (meth)acrylate, 1-(4-benzylphenyl)ethyl(meth)acrylate, and structural isomers thereof, without being limitedthereto. That is, it should be understood that the (meth)acrylates asset forth herein are provided by way of example only and the presentinvention is not limited thereto. Further, the (meth)acrylates accordingto the present invention include all acrylates corresponding tostructural isomers thereof. For example, although only 2-phenylethyl(meth)acrylate is mentioned above by way of example, the (meth)acrylatesaccording to the present invention include all of 3-phenylethyl(meth)acrylate and 4-phenyl (meth)acrylate.

Specifically, in Formula 2, s may be an integer of 1 to 5 and R₆ may bea substituted or unsubstituted phenylphenoxy group, a substituted orunsubstituted phenylphenylthiol group, a substituted or unsubstitutedbiphenylphenoxy group, or a substituted or unsubstitutedterphenylphenoxy group, wherein a substituent may be a heavy hydrogenatom, a C₁ to C₁₀ alkyl group, a C₁ to C₁₀ alkoxy group, a C₆ to C₁₈aryl group, a C₃ to C₁₈ hetero-aryl group, or a thiol group.

The aromatic mono(meth)acrylate (B1) may be present in an amount of 10wt % to 50 wt %, for example, 15 wt % to 40 wt %, or 15 wt % to 35 wt %,based on the total amount of the indole based photocurable monomer, thenon-indole based photocurable monomer, and the initiator. Within thisrange, the aromatic mono(meth)acrylate (B1) can improve plasmaresistance of the encapsulation composition.

The non-aromatic mono(meth)acrylate (B2) may be a substituted orunsubstituted C₁ to C₂₀ alkyl group-containing mono(meth)acrylate.Specifically, the non-aromatic mono(meth)acrylate (B2) may be anunsubstituted linear C₁ to C₂₀ alkyl group-containingmono(meth)acrylate, more specifically an unsubstituted linear C₁₀ to C₂₀alkyl group-containing mono(meth)acrylate. For example, the non-aromaticmono(meth)acrylate (B2) may include a least one of decyl (meth)acrylate,undecyl (meth)acrylate, lauryl (meth)acrylate, tridecyl (meth)acrylate,tetradecyl (meth)acrylate, pentadecyl (meth)acrylate, hexadecyl(meth)acrylate, heptadecyl (meth)acrylate, octadecyl (meth)acrylate,nonadecyl (meth)acrylate, and arachidyl (meth)acrylate, without beinglimited thereto.

The non-aromatic mono(meth)acrylate (B2) may be optionally present in anamount of 0 wt % to 30 wt % or less, for example, 0 wt % to 20 wt % orless or 0.1 wt % to 20 wt %, based on the total amount of the indolebased photocurable monomer, the non-indole based photocurable monomer,and the initiator.

The monofunctional monomer may be present in an amount of 10 wt % to 60wt %, for example, 15 wt % to 55 wt %, based on the total amount of theindole based photocurable monomer, the non-indole based photocurablemonomer, and the initiator. Within this range, the encapsulationcomposition can exhibit low viscosity and high adhesive strength.

The polyfunctional monomer can increase the photocuring rate of theencapsulation composition. The polyfunctional monomer may include atleast one of a di(meth)acrylate, a tri(meth)acrylate, atetra(meth)acrylate, a penta(meth)acrylate, and a hexa(meth)acrylate.Preferably, the polyfunctional monomer includes a di(meth)acrylate. Thedi(meth)acrylate may include a di(meth)acrylate alone or a mixture of(C1) a di(meth)acrylate and (C2) a di(meth)acrylate.

The di(meth)acrylate (C1) is a non-silicone based group free fromsilicon (Si) and may include a di(meth)acrylate, which has a substitutedor unsubstituted C₁ to C₂₀ alkylene group, preferably, an unsubstitutedC₁ to C₁₅ alkylene group, between (meth)acrylate groups. Here, thecarbon number of the alkylene group means the number of carbon atoms inthe alkylene group per se excluding carbon atoms in the di(meth)acrylategroup. For example, the di(meth)acrylate (C1) may be represented byFormula 3:

wherein in Formula 3,

R₇ and R₈ are independently a hydrogen atom or a methyl group, and

R₉ is a substituted or unsubstituted C₁ to C₂₀ alkylene group.

For example, in Formula 3, R₉ may be an unsubstituted C₈ to C₁₂ alkylenegroup. More specifically, the di(meth)acrylate (C1) may include at leastone of octanediol di(meth)acrylate, nonanediol di(meth)acrylate,decanediol di(meth)acrylate, undecanediol di(meth)acrylate, anddodecanediol di(meth)acrylate.

The di(meth)acrylate (C1) may be present in an amount of 10 wt % to 70wt %, preferably 30 wt % to 70 wt %, more preferably 40 wt % to 65 wt %,based on the total amount of the indole based photocurable monomer, thenon-indole based photocurable monomer, and the initiator. Within thisrange, the di(meth)acrylate (C1) can increase the crosslinking densityof the encapsulation composition to improve strength of a layer formedof the encapsulation composition.

The di(meth)acrylate (C2) may include a silicone based di(meth)acrylatecontaining Si. The encapsulation composition includes a mixture of anon-silicone based di(meth)acrylate and a silicone baseddi(meth)acrylate as the di(meth)acrylate, thereby reducing viscosity andcuring shrinkage.

The di(meth)acrylate (C2) may be represented by Formula 4:

wherein in Formula 4,

R₁₁ and R₁₂ are identical to or different from each other, and R₁₁ andR₁₂ are independently a single bond, a substituted or unsubstituted C₁to C₂₀ alkylene group, a substituted or unsubstituted C₁ to C₃₀ alkyleneether group, *—N(R′)—R″—* (* being a linking site of an element, R′being a substituted or unsubstituted C₁ to C₃₀ alkyl group, and R″ beinga substituted or unsubstituted C₁ to C₂₀ alkylene group), a substitutedor unsubstituted C₆ to C₃₀ arylene group, a substituted or unsubstitutedC₇ to C₃₀ arylalkylene group, or *—O—R″—* (* being a linking site of anelement and R″ being a substituted or unsubstituted C1 to C20 alkylenegroup),

X₁, X₂, X₃, X₄, X₅ and X₆ are identical to or different from each other,and X₁, X₂, X₃, X₄, X₅ and X₆ are independently a hydrogen atom, asubstituted or unsubstituted C₁ to C₃₀ alkyl group, a substituted orunsubstituted C₁ to C₃₀ alkyl ether group, *—N(R′)(R″) (* being alinking site of an element, and R′ and R″ being identical to ordifferent from each other and being independently a hydrogen atom or asubstituted or unsubstituted C₁ to C₃₀ alkyl group), a substituted orunsubstituted C₁ to C₃₀ alkylsulfide group, a substituted orunsubstituted C₆ to C₃₀ aryl group, or a substituted or unsubstituted C₇to C₃₀ arylalkyl group,

where at least one of X₁, X₂, X₃, X₄, X₅ and X₆ is a substituted orunsubstituted C₆ to C₃₀ aryl group, and

Y₁ and Y₂ are identical to or different from each other, and Y₁ and Y₂are independently represented by Formula 5:

wherein in Formula 5,

* is a linking site of an element, Z is a hydrogen atom or a substitutedor unsubstituted C₁ to C₃₀ alkyl group), and

n is an integer of 0 to 30 or has an average value of 0 to 30.

Here, the term “single bond” refers to a direct bond (Y₁—Si) between Siand Y₁ without any intervening element therebetween or a direct bond(Si—Y₂) between Si and Y₂ without any intervening element therebetween.

Specifically, R₁₁ and R₁₂ may be independently a C₁ to C₅ alkylene groupor a single bond. Specifically, X₁, X₂, X₃, X₄, X₅ and X₆ may beindependently a C₁ to C₅ alkyl group or a C₆ to C₁₀ aryl group, whereinat least one of X₁, X₂, X₃, X₄, X₅ and X₆ may be a C₆ to C₁₀ aryl group.More specifically, X₁, X₂, X₃, X₄, X₅ and X₆ may be independently a C₁to C₅ alkyl group or a C₆ to C₁₀ aryl group, wherein one, two, three orsix of X₁, X₂, X₃, X₄, X₅ and X₆ may be a C₆ to C₁₀ aryl group. Morespecifically, X₁, X₂, X₃, X₄, X₅ and X₆ may be independently a methylgroup, an ethyl group, a propyl group, a butyl group, a pentyl group, aphenyl group, or a naphthyl group, wherein one, two, three or six of X₁,X₂, X₃, X₄, X₅ and X₆ may be independently a phenyl group or a naphthylgroup. Specifically, n may be an integer of 1 to 5.

Specifically, the di(meth)acrylate (C2) may be represented by anyone ofthe following Formulae 4-1 to 4-6.

The di(meth)acrylate (C2) may have a weight average molecular weight of100 g/mol to 2,000 g/mol, specifically 200 g/mol to 1,000 g/mol. Withinthis range, the encapsulation composition exhibits good depositioncharacteristics and can realize an organic barrier layer having a lowplasma etching rate.

The di(meth)acrylate (C2) may be prepared by a typical method or may beobtained from commercially available products. For example, thedi(meth)acrylate (C2) may be prepared by reacting a siloxane compoundcontaining an aryl group having at least one silicone bond with acompound for extending the carbon number (for example: allyl alcohol),followed by reacting with (meth)acryloyl chloride, without being limitedthereto. Alternatively, the di(meth)acrylate (C2) may be prepared byreacting a siloxane compound containing an aryl group having at leastone silicone bond with (meth)acryloyl chloride, without being limitedthereto.

The di(meth)acrylate (C2) may be optionally present in an amount of 0 wt% to 30 wt % or less, preferably 0.1 wt % to 30 wt %, based on the totalamount of the indole based photocurable monomer, the non-indole basedphotocurable monomer, and the initiator.

The tri(meth)acrylate may include tri(meth)acrylates of C₃ to C₂₀ triol,tetraol, pentaol or hexaol, such as trimethylolpropanetri(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritoltri(meth)acrylate, and the like. The tetra(meth)acrylate may includetetra(meth)acrylates of C₄ to C₂₀ tetraol, pentaol or hexaol, such aspentaerythritol tetra(meth)acrylate, dipentaerythritoltetra(meth)acrylate, and the like. The penta(meth)acrylate may includepenta(meth)acrylates of C₄ to C₂₀ pentaol or hexaol, such asdipentaerythritol penta(meth)acrylate, and the like. Thehexa(meth)acrylate may include hexa(meth)acrylates of C₄ to C₂₀ hexaol,such as dipentaerythritol hexa(meth)acrylate and the like.

The polyfunctional monomer may be present in an amount of 10 wt % to 80wt %, for example, 20 wt % to 80 wt %, or 40 wt % to 80 wt %, based onthe total amount of the indole based photocurable monomer, thenon-indole based photocurable monomer, and the initiator. Within thisrange, the polyfunctional monomer can increase the crosslinking densityof the encapsulation composition to improve strength of a layer formedof the encapsulation composition.

The non-indole based photocurable monomer may be present in an amount of50 wt % to 98 wt %, preferably 90 wt % to 95 wt %, based on the totalamount of the indole based photocurable monomer, the non-indole basedphotocurable monomer, and the initiator. Within this range, thenon-indole based photocurable monomer can reduce light transmittancewithin the above wavelength range, thereby preventing damage to theorganic light emitting diode while improving plasma resistance of theencapsulation composition.

The non-indole based photocurable monomer may include the monofunctionalmonomer and the polyfunctional monomer in a weight ratio of 1:0.5 to1:10, preferably 1:0.5 to 1:5. Within this range, the non-indole basedphotocurable monomer can increase the curing rate of the organic barrierlayer and can secure a suitable range of viscosity to improvecoatability of the encapsulation composition.

Initiator

The initiator may include any typical photopolymerization initiatorscapable of photocuring reaction. For example, the photopolymerizationinitiator may include a triazine initiator, an acetophenone initiator, abenzophenone initiator, a thioxanthone initiator, a benzoin initiator, aphosphorus initiator, an oxime initiator, or mixtures thereof.

The phosphorus initiator may includediphenyl(2,4,6-trimethylbenzoyl)phosphine oxide,benzyl(diphenyl)phosphine oxide,bis(2,6-dimethoxybenzoyl)(2,4,4-trimethylpentyl)phosphine oxide, ormixtures thereof. For example, the phosphorus initiator can exhibitbetter initiation performance under UV light of long wavelengths in theencapsulation composition according to the present invention. Theseinitiators may be used alone or as a mixture thereof.

In the encapsulation composition, the initiator may be present in anamount of 1 wt % to 40 wt %, specifically 1 wt % to 10 wt %, 1 wt % to 9wt %, or 1 wt % to 8 wt %, based on the total amount of the indole basedphotocurable monomer, the non-indole based photocurable monomer, and theinitiator. Within this range, the initiator allows sufficientphotopolymerization upon exposure to light and can prevent deteriorationin light transmittance due to unreacted initiator remaining afterphotopolymerization.

The encapsulation composition according to the present invention may beprepared by mixing the indole based photocurable monomer, the non-indolebased photocurable monomer and the initiator. The encapsulationcomposition may be formed as a solvent-free composition not containing asolvent. For example, when the encapsulation composition is asolvent-free composition, wt % is based on the total weight of theindole based photocurable monomer, the non-indole based photocurablemonomer and the initiator.

The encapsulation composition according to the present invention is aphotocurable composition and may be cured by irradiation with UV lightat 10 to 500 mW/cm² for 1 to 50 seconds.

The encapsulation composition may have a viscosity at 25° C.±2° C. ofabout 7 cP to 50 cP. Within this range, the encapsulation compositionallows easy formation of an organic barrier layer through depositionthereof.

The encapsulation composition may be used in encapsulation of an organiclight emitting diode. Specifically, the encapsulation composition mayform organic barrier layers in an encapsulation structure whereininorganic barriers and the organic barrier layers are sequentiallystacked one above another. Particularly, the encapsulation compositionmay be used in a flexible organic light emitting diode display.

The encapsulation composition may be used in encapsulation of a memberfor an apparatus, particularly, a member for displays, which can sufferfrom degradation or deterioration in quality due to permeation of gas orliquid in a surrounding environment, for example, atmospheric oxygenand/or moisture and/or water vapor and due to permeation of chemicalsused in the preparation of electronic products. Examples of the memberfor an apparatus may include illumination devices, metal sensor pads,microdisc lasers, electrochromic devices, photochromic devices,microelectromechanical systems, solar cells, integrated circuits, chargecoupled devices, light emitting polymers, light emitting diodes, and thelike, without being limited thereto.

An organic light emitting diode display according to the presentinvention may include an organic barrier layer formed of theencapsulation composition for encapsulating an organic light emittingdiode according to the embodiments of the present invention.Specifically, the organic light emitting diode display may include anorganic light emitting diode and a barrier stack formed on the lightemitting device and including an inorganic barrier layer and an organicbarrier layer, in which the organic barrier layer may be formed of theencapsulation composition according to the embodiments of the presentinvention. As a result, the organic light emitting diode display canexhibit high reliability.

Next, an organic light emitting diode display according to oneembodiment of the present invention will be described with reference toFIG. 1 . FIG. 1 is a cross-sectional view of an organic light emittingdiode display according to one embodiment of the present invention.

Referring to FIG. 1 , an organic light emitting diode display 100according to this embodiment includes a substrate 10, an organic lightemitting diode 20 formed on the substrate 10, and a barrier stack 30formed on the organic light emitting diode 20 and including an inorganicbarrier layer 31 and an organic barrier layer 32, wherein the inorganicbarrier layer 31 adjoins the organic light emitting diode 20, and theorganic barrier layer 32 may be formed of the encapsulation compositionfor encapsulating an organic light emitting diode according to theembodiments of the present invention.

The substrate 10 may be selected from any substrate so long as anorganic light emitting diode can be formed on the substrate 10. Forexample, the substrate 10 may be formed of a material, such astransparent glass, a plastic sheet, and a silicon or metal substrate.

The organic light emitting diode 20 is commonly used in an organic lightemitting diode display, and, although not shown in FIG. 1 , may includea first electrode, a second electrode, and an organic light emittinglayer formed between the first electrode and the second electrode. Inaddition, the organic light emitting layer may have a structure whereina hole injection layer, a hole transport layer, a light emitting layer,an electron transport layer, and an electron injection layer aresequentially stacked, without being limited thereto.

The barrier stack 30 includes the inorganic barrier layer 31 and theorganic barrier layer 32, and the inorganic and organic barrier layers31, 32 are composed of different components, thereby realizing thefunctions of encapsulating the organic light emitting diode.

The inorganic barrier layer 31 includes different components than theorganic barrier layer 32, thereby supplementing the effects of theorganic barrier layer 32. The inorganic barrier layer 31 may be formedof inorganic materials having good light transmittance and good moistureand/or oxygen barrier properties. For example, the inorganic barrierlayer 31 may include at least one selected from among metals; nonmetals;compounds or alloys of at least two metals; compounds or alloys of atleast two nonmetals; oxides of metals, nonmetals or mixtures thereof;fluorides of metals or nonmetals or mixtures thereof; nitrides ofmetals, nonmetals or mixtures thereof; carbides of metals, nonmetals ormixtures thereof; oxynitrides of metals, nonmetals or mixtures thereof;borides of metals, nonmetals or mixtures thereof; oxyborides of metals,nonmetals or mixtures thereof; silicides of metals, nonmetals ormixtures thereof; and mixtures thereof. The metals or nonmetals mayinclude silicon (Si), aluminum (AI), selenium (Se), zinc (Zn), antimony(Sb), indium (In), germanium (Ge), tin (Sn), bismuth (Bi), transitionmetals, and lanthanide metals, without being limited thereto.Specifically, the inorganic barrier layer may be silicon oxide(SiO_(x)), silicon nitride (SiN_(x)), silicon oxynitride (SiO_(x)N_(y)),zinc selenide (ZnSe), zinc oxide (ZnO), antimony trioxide (Sb₂O₃),aluminum oxide (AlO_(x)) including alumina (Al₂O₃), indium oxide(In₂O₃), or tin oxide (SnO₂).

The inorganic barrier layer 31 may be deposited by a plasma process or avacuum process, for example, sputtering, chemical vapor deposition,plasma chemical vapor deposition, evaporation, sublimation, electroncyclotron resonance-plasma enhanced chemical vapor deposition, orcombinations thereof.

The organic barrier layer 32 and the inorganic barrier layer 31 arealternately deposited, thereby securing planarization properties of theinorganic barrier layer 31, while preventing defects of one inorganicbarrier layer 31 from spreading to other inorganic barrier layers 31.

The organic barrier layer 32 may be formed by coating, deposition, orcuring of the encapsulation composition according to the embodiments ofthe present invention, or combinations thereof. For example, the organicbarrier layer 32 may be formed by coating the encapsulation compositionto a thickness of 1 μm to 50 μm, followed by curing the encapsulationcomposition through irradiation at 10 mW/cm² to 500 mW/cm² for 1 secondto 50 seconds.

The barrier stack 30 may include any number of the organic barrier layer32 and the inorganic barrier layer 31. Combination of the organicbarrier layer 32 and the inorganic barrier layer 31 may vary with alevel of permeation resistance to oxygen and/or moisture and/or watervapor and/or chemicals. For example, the organic barrier layers 32 andthe inorganic barrier layers 31 may be formed in a total of 10 layers orless, for example, 2 layers to 7 layers. Specifically, the organicbarrier layers 32 and the inorganic barrier layers 31 may be formed in atotal of 7 layers in the following order: inorganic barrier layer31/organic barrier layer 32/inorganic barrier layer 31/organic barrierlayer 32/inorganic barrier layer 31/organic barrier layer 32/inorganicbarrier layer 31.

In the barrier stack 30, the organic barrier layers 32 and the inorganicbarrier layers 31 may be alternately deposited. This is because theaforementioned encapsulation composition has an effect on the organicbarrier layer 32 due to the properties thereof. As a result, the organicbarrier layer 32 and the inorganic barrier layer 31 can supplement orreinforce encapsulation of the member for the apparatus.

Next, an organic light emitting diode display according to anotherembodiment of the present invention will be described with reference toFIG. 2 . FIG. 2 is a cross-sectional view of an organic light emittingdiode display according to another embodiment of the present invention.

Referring to FIG. 2 , an organic light emitting diode display 200according to this embodiment includes a substrate 10, an organic lightemitting diode 20 formed on the substrate 10, and a barrier stack 30formed on the organic light emitting diode 20 and including an inorganicbarrier layer 31 and an organic barrier layer 32, in which the inorganicbarrier layer 31 encapsulates an inner space 40 which receives theorganic light emitting diode 20 therein, and the organic barrier layer32 may be formed of the encapsulation composition for encapsulating anorganic light emitting diode according to the embodiments of the presentinvention. The organic light emitting diode display according to thisembodiment is substantially the same as the organic light emitting diodedisplay according to the above embodiment except that the inorganicbarrier layer 31 does not adjoin the organic light emitting diode 20.

Next, the present invention will be described in more detail withreference to some examples. It should be understood that these examplesare provided for illustration only and are not to be construed in anyway as limiting the present invention.

Preparative Example 1: Preparation of Indole Based Photocurable Monomer

A compound represented by Formula 1-1 was prepared.

Step 1: In a 1,000 ml flask provided with a cooling tube, a Dean-Starkapparatus and a stirrer, 200 g of cyanoacetic acid, 320 g of 2-hydroxyethyl methacrylate, 600 ml of toluene, and 3 g of concentrated sulfuricacid (Daejung Chemicals & Materials Co., Ltd.) were placed, followed bynitrogen purging for 30 minutes and heating the flask to 160° C. toremove water therefrom. The solvent was removed through distillation,thereby obtaining 2-(2-cyanoacetoxy)ethyl methacrylate (molecularweight: 197.19 g/mol) and having a purity of 96% as measured by HPLC.(¹H NMR: δ6.12, s, 1H; δ5.62, s, 1H; δ4.45, m, 2H; δ4.38, m, 2H; δ3.01,s, 2H; (δ1.94, s, 3H).

Step 2: In a 500 ml flask provided with a cooling tube and a stirrer,15.2 g of KOH, 38 g of iodomethane, 50 g of 2-phenyl1H-Indole-3-carboxaldehyde, and 150 g of DMF (dimethylformamide) wereplaced and stirred at room temperature for 12 hours. The solvent wasremoved through distillation, thereby obtaining 1-methyl 2-phenyl1H-indole-3-carboxaldehyde (molecular weight: 235.28 g/mol) and having apurity of 96% as measured by HPLC. (1H NMR: δ9.76, s, 1H; δ 8.46, m, 1H;δ7.59, m, 3H; δ7.52, m, 2H; δ7.42, m, 3H; δ3.79, s, 3H)

Step 3: In a 500 ml flask provided with a cooling tube and a stirrer, 21g of 1-methyl 2-phenyl 1H-Indole-3-carboxaldehyde obtained in Step 2,21.2 g of 2-(2-cyanoacetoxy)ethyl methacrylate obtained in Step 1, 2.3 gof piperidine, and 230 g of pyridine were placed and stirred at roomtemperature for 12 hours. The solvent was removed through distillation,followed by recrystallization with ethanol, thereby obtaining a compoundrepresented by Formula 1-1 (molecular weight: 414.45 g/mol) and having apurity of 98% as measured by HPLC. (¹H NMR: δ8.46, m, 1H; δ8.17, s, 1H;δ7.59, m, 3H; δ7.42, m, 5H; δ6.15, s, 1H; δ5.62, s, 1H; δ4.51, m, 2H;(δ4.42, m, 2H; δ3.75, s, 3H; δ1.96, s, 3H)

Preparative Example 2: Preparation of Silicone Based Di(Meth)Acrylate

In a 1,000 ml flask provided with a cooling tube and a stirrer, 300 mlof ethyl acetate, 21 g of 3,3-diphenyl-1,1,5,5-tetramethyltrisiloxaneand 43 g of allyl alcohol (Daejung Chemicals & Materials Co., Ltd.) wereplaced, followed by nitrogen purging for 30 minutes. Next, 72 ppm ofPt-on-carbon black powder (Aldrich GmbH) was added thereto, followed byheating the flask to 80° C. and stirring the components for 4 hours. Theremaining solvent was removed by distillation, thereby obtaining acompound. 71.5 g of the obtained compound and 39 g of triethylamine weresequentially added to 300 ml of dichloromethane, followed by slowlyadding 30.2 g of methacryloyl chloride while stirring the mixture at 0°C. The remaining solvent was removed by distillation, thereby obtaininga compound (molecular weight: 584.92 g/mol) represented by Formula 4-2and having a purity of 96% as measured by HPLC.

(¹H NMR: δ7.52, m, 6H; δ7.42, m, 4H; δ6.25, d, 2H; δ6.02, dd, 2H; δ5.82,t, 1H; δ5.59, d, 2H; δ3.86, m, 4H; δ1.52, m, 4H; δ0.58, m, 4H; δ0.04, m,12H)

Details of components used in Examples and Comparative Examples were asfollows.

(A) Indole based photocurable monomer: Photocurable monomer ofPreparative Example 1;

(B) Non-indole based photocurable monomer: (B1) 2-phenylphenoxy acrylate(M1142, Miwon Co., Ltd.), (B2) lauryl acrylate (Sartomer Co., Ltd.);

(C) Non-indole based photocurable monomer: (C1) 1,2-dodecandioldiacrylate (Sartomer Co., Ltd.), (C2) Monomer of Preparative Example 2;

(D) Initiator: Darocur TPO (BASF) (phosphorus initiator);

(E) UV absorbent: BONARSORB (represented by Formula 6).

Example 1

3 parts by weight of (A) photocurable monomer of Preparative Example 1,33 parts by weight of (B1) 2-phenylphenoxy acrylate, 61 parts by weightof (C) 1,2-dodecanediol acrylate, and 3 parts by weight of (D) initiatorwere placed in a 125 ml brown polypropylene bottle, and mixed by ashaker at room temperature for 3 hours, thereby obtaining anencapsulation composition.

Examples 2 to 5 and Comparative Examples 1 to 3

Encapsulation compositions were prepared in the same manner as inExample 1 except that the amounts of the components of Example 1 werechanged as listed in Table 1 (unit: parts by weight).

Each of the encapsulation compositions prepared in Examples 1-5 andComparative Examples 1-3 was evaluated as to the following properties aslisted in Table 1. Results are shown in Table 1.

(1) Viscosity: The viscosity of each of the encapsulation compositionsprepared in Examples 1-5 and Comparative Examples 1-3 was measured at25° C. using a viscometer Spindle No. 40 (LV DV-II Pro, Brookfield Co.,Ltd.).

(2) Photocuring rate: The intensity of absorption peaks in the vicinityof 1,635 cm⁻¹ (C═C) and 1,720 cm⁻¹ (C═O) of each of the encapsulationcompositions was measured using an FT-IR spectrometer (NICOLET 4700,Thermo Co., Ltd.). Each encapsulation composition was applied to a glasssubstrate through a sprayer, followed by curing through UV irradiationat 100 mW/cm² for 10 seconds, thereby preparing a specimen having a sizeof 20 cm×20 cm×3 μm (width×length×thickness). Then, the intensity ofabsorption peaks of the cured film was measured in the vicinity of 1,635cm⁻¹ (C═C) and 1,720 cm⁻¹ (C═O) using an FT-IR spectrometer (NICOLET4700, Thermo Co., Ltd.). Photocuring rate was calculated by Equation 1:

Photocuring rate (%)=|1−(A/B)|×100,  <Equation 1>

wherein in Equation 1, A is a ratio of the intensity of an absorptionpeak in the vicinity of 1,635 cm⁻¹ to the intensity of an absorptionpeak in the vicinity of 1,720 cm⁻¹ measured for the cured film, and

B is a ratio of the intensity of an absorption peak in the vicinity of1,635 cm⁻¹ to the intensity of an absorption peak in the vicinity of1,720 cm⁻¹ measured for the encapsulation composition).

(3) Plasma etching rate: Each of the encapsulation compositions wasdeposited with a predetermined thickness on a Si wafer and photocured toform an organic barrier layer, followed by measuring the initialdeposition height (T1, unit: μm) of the organic barrier layer. Theorganic barrier layer was then subjected to induction coupled plasma(ICP) treatment under conditions of ICP power: 2,500 W, RE power: 300 W,DC bias: 200V, Ar flow: 50 sccm, etching time: 1 min, and pressure: 10mTorr, followed by measuring the height (T2, unit: μm) of the organicbarrier layer. The height (thickness) of the organic barrier layer wasmeasured using an FE-SEM (Hitachi High Technologies Corporation). Plasmaetching rate was calculated by Equation 2:

Plasma etching rate of organic barrier layer(%)=(T1−T2)/T1×100.  <Equation 2>

(4) Light transmittance: Each of the encapsulation compositions wascured through UV irradiation under N₂ conditions to form a 10 μm-thickfilm, and light transmittance thereof was measured at a wavelength of405 nm using a Lambda 950 (Perkin Elmer Co., Ltd.).

TABLE 1 Comparative Example Example 1 2 3 4 5 1 2 3 A 3 3 3 5 2 0 0 0 BB1 33 33 19 32 33 34 20 34 B2 0 20 0 0 0 0 0 0 C C1 61 41 47 60 62 63 4862 C2 0 0 28 0 0 0 29 0 D 3 3 3 3 3 3 3 3 E 0 0 0 0 0 0 0 1 Viscosity21.2 15.2 22.6 21.8 21.0 20.1 21.4 21.3 (cps, @25° C.) Photocuring rate(%) 91.2 92.3 92.5 92.0 92.3 91.5 92.4 90.2 Plasma etching rate (%) 6.16.2 6.8 6.1 6.2 6.2 7.1 7.8 Light transmittance 7.2 7.9 7.6 2.1 9.7 9999 21 (%. @405 nm)

As shown in Table 1, the encapsulation compositions according to thepresent invention had low light transmittances at a wavelength of 420 nmor less, low plasma etching rates, and high photocuring rates.Conversely, the encapsulation compositions of Comparative Examples 1 and2 prepared without the indole based photocurable monomer according tothe present invention had high light transmittance at a wavelength of420 nm or less, and the encapsulation composition of Comparative Example2 had a high plasma etching rate.

In addition, the encapsulation composition of Comparative Example 3prepared using an UV absorbent containing an indole based functionalgroup substantially similar to the indole based photocurable monomeraccording to the present invention could not be used over an amount of1% due to a solubility problem and had problems of a high lighttransmittance at 420 nm or less and a high plasma etching rate whenpresent in an amount of 1%.

It should be understood that various modifications, changes,alterations, and equivalent embodiments can be made by those skilled inthe art without departing from the spirit and scope of the presentinvention.

What is claimed is:
 1. A composition for encapsulating an organic lightemitting diode, comprising: an indole based photocurable monomer; anon-indole based photocurable monomer; and an initiator, wherein theindole based photocurable monomer contains an indole group having acyano (C≡N) group-coupled vinyl group.
 2. The composition forencapsulating an organic light emitting diode according to claim 1,wherein the indole based photocurable monomer is represented by Formula1:

where, in Formula 1, R¹ is a substituted or unsubstituted C₁ to C₁₀alkyl group, a substituted or unsubstituted C₆ to C₂₀ aryl group, or asubstituted or unsubstituted C₇ to C₂₀ arylalkyl group, R² is asubstituted or unsubstituted C₆ to C₂₀ aryl group, R³ is a substitutedor unsubstituted C₁ to C₁₀ alkylene group or a substituted orunsubstituted C₁ to C₁₀ alkyleneoxy group, and R⁴ is a hydrogen atom ora substituted or unsubstituted C₁ to C₅ alkyl group.
 3. The compositionfor encapsulating an organic light emitting diode according to claim 1,wherein the indole based photocurable monomer is represented by at leastone of Formula 1-1 to Formula 1-4:


4. The composition for encapsulating an organic light emitting diodeaccording to claim 1, wherein the indole based photocurable monomer ispresent in an amount of 1 wt % to 10 wt % based on a total amount of theindole based photocurable monomer, the non-indole based photocurablemonomer, and the initiator.
 5. The composition for encapsulating anorganic light emitting diode according to claim 1, wherein thenon-indole based photocurable monomer comprises a mixture of amonofunctional monomer and a polyfunctional monomer.
 6. The compositionfor encapsulating an organic light emitting diode according to claim 5,wherein the monofunctional monomer comprises an aromaticmono(meth)acrylate (B1) alone or a mixture of the aromaticmono(meth)acrylate (B1) and a non-aromatic mono(meth)acrylate (B2). 7.The composition for encapsulating an organic light emitting diodeaccording to claim 6, wherein the aromatic mono(meth)acrylate (B1) isrepresented by Formula 2:

where, in Formula 2, R₅ is a hydrogen atom or a methyl group, s is aninteger of 0 to 10, and R₆ is a substituted or unsubstituted C₆ to C₅₀aryl group or a substituted or unsubstituted C₆ to C₅₀ aryloxy group. 8.The composition for encapsulating an organic light emitting diodeaccording to claim 5, wherein the polyfunctional monomer comprises anon-silicone based di(meth)acrylate (C1) alone or a mixture of thenon-silicone based di(meth)acrylate (C1) and a silicone baseddi(meth)acrylate (C2).
 9. The composition for encapsulating an organiclight emitting diode according to claim 8, wherein the silicone baseddi(meth)acrylate (C2) is represented by Formula 4:

where, in Formula 4, R₁₁ and R₁₂ are identical to or different from eachother, and R₁₁ and R₁₂ are independently a single bond, a substituted orunsubstituted C₁ to C₂₀ alkylene group, a substituted or unsubstitutedC₁ to C₃₀ alkylene ether group, *—N(R′)—R″—* (wherein * is a linkingsite of an element, R′ is a substituted or unsubstituted C₁ to C₃₀ alkylgroup, and R″ is a substituted or unsubstituted C₁ to C₂₀ alkylenegroup), a substituted or unsubstituted C₆ to C₃₀ arylene group, asubstituted or unsubstituted C₇ to C₃₀ arylalkylene group, or*—O—R″—*″—* (wherein * is a linking site of an element, and R″ is asubstituted or unsubstituted C₁ to C₂₀ alkylene group), X₁, X₂, X₃, X₄,X₅, and X₆ are identical to or different from each other, and X₁, X₂,X₃, X₄, X₅, and X₆ are independently a hydrogen atom or a substituted orunsubstituted C₁ to C₃₀ alkyl group, a substituted or unsubstituted C₁to C₃₀ alkyl ether group, *—N(R′)(R″), a substituted or unsubstituted C₁to C₃₀ alkylsulfide group, a substituted or unsubstituted C₆ to C₃₀ arylgroup, or a substituted or unsubstituted C₇ to C₃₀ arylalkyl group, andat least one of X₁, X₂, X₃, X₄, X₅, and X₆ is a substituted orunsubstituted C₆ to C₃₀ aryl group, Y₁ and Y₂ are identical to ordifferent from each other, and Y₁ and Y₂ are independently representedby Formula 5:

where, in Formula 5, * is a linking site of an element, and Z is ahydrogen atom or a substituted or unsubstituted C₁ to C₃₀ alkyl group.10. The composition for encapsulating an organic light emitting diodeaccording to claim 1, comprising: 1 wt % to 10 wt % of the indole basedphotocurable monomer; 50 wt % to 98 wt % of the non-indole basedphotocurable monomer; and 1 wt % to 40 wt % of the initiator.
 11. Anorganic light emitting diode display, comprising: an organic lightemitting diode; and a barrier stack formed on the organic light emittingdiode and comprising an inorganic barrier layer and an organic barrierlayer, wherein the organic barrier layer is formed of the compositionfor encapsulating an organic light emitting diode according to claim 1.